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Materials Research Society. Used - Like New. 1999. Small publisher's mark on bottom of text block. Otherwise, Fine.
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Ultrathin SiO2 and High-K Materials for ULSI Gate Dielectrics: Volume 567 (MRS Proceedings) Hardcover - 1999
by Huff, H.R. (ed)
Details
- Title Ultrathin SiO2 and High-K Materials for ULSI Gate Dielectrics: Volume 567 (MRS Proceedings)
- Author Huff, H.R. (ed)
- Binding Hardcover
- Language ENG
- Publisher Cambridge University Press, Warrendale, Pennsylvania, U.S.A.
- Date 1999-09
- ISBN 9781558994744
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Ultrathin SiO2 and Higg-K Materials for ULSI Gate Dielectrics: Volume 567 (MRS Proceedings)
by Huff, H.R. (ed)
- Used
- Condition
- Used - Like New
- ISBN 10 / ISBN 13
- 9781558994744 / 1558994742
- Quantity Available
- 1
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Chicago, Illinois, United States
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€17.01€3.31 shipping to USA
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€17.01
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Stock Photo: Cover May Be Different
Ultrathin SiO2 and Higg-K Materials for ULSI Gate Dielectrics: Volume 567 (MRS Proceedings)
by Huff, H.R. (ed)
- Used
- Hardcover
- Condition
- Used - Good
- Binding
- Hardcover
- ISBN 10 / ISBN 13
- 9781558994744 / 1558994742
- Quantity Available
- 1
- Seller
-
Chicago, Illinois, United States
- Item Price
-
€17.01€3.31 shipping to USA
Show Details
Description:
Materials Research Society. Used - Good. 1999. Hardcover. Tears to bottom edge of pages from front endpapers through to p. ix. Remainder mark. Ends of spine bumped. Good.
Item Price
€17.01
€3.31
shipping to USA
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Ultrathin SiO2 and Higg-K Materials for ULSI Gate Dielectrics: Volume 567 (MRS Proceedings)
by Editor-M. L. Green; Editor-T. Hattori; Editor-H. R. Huff; Editor-G. Lucovsky; Editor-C. A. Richter
- Used
- good
- Hardcover
- Condition
- Used - Good
- Binding
- Hardcover
- ISBN 10 / ISBN 13
- 9781558994744 / 1558994742
- Quantity Available
- 1
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HOUSTON, Texas, United States
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€29.84FREE shipping to USA
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Description:
Materials Research Society, 1999-09-01. Hardcover. Good.
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€29.84
FREE shipping to USA