Plasma Etching: An Introduction (Plasma -- Materials Interactions) by Manos, Dennis M. [Editor]; Flamm, Daniel L. [Editor];

Boston: Academic Press, 1992. Hardover, [xii], 476 pages. Near Fine condition. Size 9.25"x6.25". "Plasma etching plays an essential role in microelectronic circuit manufacturing. Suitable for researchers, process engineers, and graduate students, this book introduces the basic physics and chemistry of electrical discharges and relates them to plasma etching mechanisms. Throughout the volume the authors offer practical examples of process chemistry, equipment design, and production methods." Book has very light exterior shelfwear. Previous owner's name on front fly, else Fine condition, clean and unmarked.. Near Fine.

Elsevier Science & Technology, 1989. Hardcover. Good. Disclaimer:A copy that has been read, but remains in clean condition. All pages are intact, and the cover is intact. The spine may show signs of wear. Pages can include limited notes and highlighting, and the copy can include previous owner inscriptions. At ThriftBooks, our motto is: Read More, Spend Less.Dust jacket quality is not guaranteed.

Elsevier Science & Technology. Used - Good. Used book that is in clean, average condition without any missing pages.

new hc

Hard Cover. New. New Book; Fast Shipping from UK; Not signed; Not First Edition; The Plasma Etching: An Introduction.

Hardback. New. Plasma etching plays an essential role in microelectronic circuit manufacturing. Useful for researchers, process engineers, and students, this book introduces the physics and chemistry of electrical discharges and relates them to plasma etching mechanisms. It offers practical examples of process chemistry, equipment design, and production methods.

Academic Press, 1989-08-11. Hardcover. New. New. In shrink wrap. Looks like an interesting title!